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At Laser Thermal, we are dedicated to providing accessible thermal measurements of materials, focusing on thin-film thermal conductivity.
We strive to empower our employees and enable continued growth and accessibility to new technologies for a better, more efficient, climate-positive world.
Maintaining a supportive work environment is one of our top priorities. That’s why we offer competitive salaries and benefits, a subsidized gym membership, and an unlimited PTO policy. We’re also fully committed to work-life balance and employee well-being.
We are committed to building a more inclusive workplace and world. We strive to create a culture that fosters positive relationships with customers, employees, and the community.
At Laser Thermal, we provide endless opportunities to learn and grow. Wherever you are in your career, we’re here to support you, whether it be through conferences, workshops, mentorship, certifications, or access to university resources.
We aim to foster a science-loving culture of collaboration where teamwork thrives. We value individuals who are eager to work together, share ideas, and support one another. By focusing on collaboration over competition, we believe that we can achieve remarkable results together.
As a dynamic startup working on critical industry challenges, we are seeking individuals who love to tackle new challenges head-on Whether it’s solving new, complex science and engineering problems or pushing boundaries, we encourage our team members to continuously learn and adapt.
If you’re someone who thrives on exploring the unknown and finding creative solutions, you’ll find a rewarding home here with us!
We believe there’s always room for improvement and are passionate advocates for growth. We are looking for individuals who have an insatiable hunger for learning, a genuine enthusiasm for self-improvement, and are excited by the chance to grow their career.
Kindness and respect are the cornerstones of Laser Thermal’s workplace culture. We are looking for individuals who treat their colleagues and customers with patience and kindness. Our team values empathy, active listening and open communication as we collaborate to achieve our goals.
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SSTR is ideal for your thin film thermal conductivity testing needs.
In addition to measurements of bulk wafers and substrates (source 1, source 2), SSTR has the unprecedented spatial resolution to measure the thermal conductivity of thin films.
For example, SSTR can measure the thermal conductivity of single nanometer thick ALD grown thin films or micron thick AlN films (source).
SSTR measurements on ALD grown ultrathin film amorphous gate dielectrics (compared to TDTR) (source).
SSTR measurements of AlN crystalline thin films.2 SSTR data (temperature rise vs. power) on right for AlN film and silicon wafer control.
Validated results
SSTR-F measures the thermal conductivity of Corning Pyroceram 9606 and Corning high purity fused silica (HPFS) 7980 to within 5% of their published values.
Additional validation was provided by measuring samples from the same piece of material using the Transient Plane Source technique.
Pyroceram is no longer available from NIST but was measured on similar material to the material that was validated as a Certified Reference Material.
Corning HPFS was procured from a distributor of HPFS 7980 wafers.
Accurate thermal conductivity measurements of materials in agreement with literature values
With exceptional instrumentation reliability and repeatability, SSTR-F offers unprecedented measurement stability on a daily basis for any user, exemplified by the SSTR-F data shown below. Spread in randomly sampled spots are sample related, not measurement driven.
High-throughput SSTR-F testing of multiple samples facilitates, for example, screening the thermal conductivity of different thin films processed under different conditions
Defects, stresses, compositional differences, and changes in density and microstructure that occur up during film growth result in changes in thermal conductivity, easily and rapidly identified vis SSTR-F
SSTR-F data on 4 different 200 nm dielectric films on silicon with thermal conductivity ranging from ~0.35 W/m/K up to 1.8 W/m/K. SSTR-F allows for easy, rapid and automated identification of different temperature rises based on the thermal conductivity of the different films.
