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Join the Laser Thermal team

Our growing team is passionate about developing novel optical thermal metrology techniques to address challenges in the semiconductor industry and beyond, and we need your help.

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Why work at Laser Thermal?

Our team strives to draw from all disciplines of science, technology, and engineering to better understand the thermal properties of materials–from the atomic scale all the way to final applications.

Focusing on accessible, accurate, and rapid metrology solutions for challenging materials such as thin films, we draw on knowledge of thermal transport, optics, materials physics, machine learning, AI, and intelligent design to enable continued technological advancement for a more efficient, climate-positive world.

Learn More about our team

Who should apply?

We are looking for individuals who are passionate about complex and oftentimes new science and engineering problems, excited by the prospect of working in a dynamic startup environment, and ready to contribute to a collaborative, supportive, and hard-working team. Our ideal candidates are knowledgeable, self-motivated, and love taking on new challenges.

Benefits of Working at Laser Thermal

Our team loves what we do, and we care about each other. That means working to maintain the most supportive work environment possible.

Competitive salary and benefits.
A commitment to work-life balance and employee well-being.
A chance to grow your career as part of a dynamic startup working on critical industry challenges.
Opportunities to learn about cutting-edge optical metrology technologies.
A supportive, collaborative, and science-loving culture.

Current Openings

Check back soon! New job opportunities coming in 2023.

If you are interested in joining our team at Laser Thermal, please send your resume and cover letter to careers@laserthermal.com.

Nanoscale to bulk

Thermal conductivity of nanoscale thin films

SSTR is ideal for your thin film thermal conductivity testing needs.
In addition to measurements of bulk wafers and substrates (source 1, source 2), SSTR has the unprecedented spatial resolution to measure the thermal conductivity of thin films.
For example, SSTR can measure the thermal conductivity of single nanometer thick ALD grown thin films or micron thick AlN films (source).

SSTR measurements on ALD grown ultrathin film amorphous gate dielectrics (compared to TDTR) (source).

SSTR measurements of AlN crystalline thin films.2 SSTR data (temperature rise vs. power) on right for AlN film and silicon wafer control.

Validated results

SSTR-F measures the thermal conductivity of Corning Pyroceram 9606 and Corning high purity fused silica (HPFS) 7980 to within 5% of their published values.
Additional validation was provided by measuring samples from the same piece of material using the Transient Plane Source technique.
Pyroceram is no longer available from NIST but was measured on similar material to the material that was validated as a Certified Reference Material.
Corning HPFS was procured from a distributor of HPFS 7980 wafers.

	Literature Value	TPS Measurement	SSTR-F Measurement
Pyroceram 9606	4.07 +/- .26	3.95	3.95 +/- 0.2
HPFS 7980	1.38	1.39	1.39 +/- 0.09

Unparalleled reliability

Thermal conductivity measurements: Accuracy +/- 10%, Repeatability +/- 0.5%, Reproducibility +/- 1%
Accurate thermal conductivity measurements of materials in agreement with literature values
With exceptional instrumentation reliability and repeatability, SSTR-F offers unprecedented measurement stability on a daily basis for any user, exemplified by the SSTR-F data shown below. Spread in randomly sampled spots are sample related, not measurement driven.

Source

20 SSTR-F measurements at same spot

20 SSTR-F measurements at random spots

Turnkey testing

Our patented fiber-optic design enables turnkey, automated testing of thermal conductivity.
High-throughput SSTR-F testing of multiple samples facilitates, for example, screening the thermal conductivity of different thin films processed under different conditions
Defects, stresses, compositional differences, and changes in density and microstructure that occur up during film growth result in changes in thermal conductivity, easily and rapidly identified vis SSTR-F

SSTR-F data on 4 different 200 nm dielectric films on silicon with thermal conductivity ranging from ~0.35 W/m/K up to 1.8 W/m/K. SSTR-F allows for easy, rapid and automated identification of different temperature rises based on the thermal conductivity of the different films.