Laser Thermal’s SSTR-F elevates the University of Maryland’s NEIT lab and beyond Laser Thermal has made significant strides in the thermal measurement field by using optical technologies to simplify and shorten the measurement process. This innovation is crucial for industries where thermal management is a significant challenge. A company’s ability to perform thermal measurements at...
SSTR measurements on ALD grown ultrathin film amorphous gate dielectrics (compared to TDTR) (source).
SSTR measurements of AlN crystalline thin films.2 SSTR data (temperature rise vs. power) on right for AlN film and silicon wafer control.
| Literature Value | TPS Measurement | SSTR-F Measurement | |
| Pyroceram 9606 | 4.07 +/- .26 | 3.95 | 3.95 +/- 0.2 |
| HPFS 7980 | 1.38 | 1.39 | 1.39 +/- 0.09 |
20 SSTR-F measurements at same spot
20 SSTR-F measurements at random spots
SSTR-F data on 4 different 200 nm dielectric films on silicon with thermal conductivity ranging from ~0.35 W/m/K up to 1.8 W/m/K. SSTR-F allows for easy, rapid and automated identification of different temperature rises based on the thermal conductivity of the different films.